Magnetron Sputtering
Mostrando 13-24 de 152 artigos, teses e dissertações.
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13. Optical and Structural Study of ZnO Thin Films Deposited by RF Magnetron Sputtering at Different Thicknesses: a Comparison with Single Crystal
Optical characterizations of preferred orientation (002) ZnO thin films, prepared by RF magnetron sputtering under pure argon plasma, with different thicknesses have been investigated, where grain size and resistivity increase with thickness. Energy band gap and refractive indices have been calculated. A correlation between band gap values and crystalline qu
Mat. Res.. Publicado em: 16/04/2018
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14. On the Effect of Aluminum on the Microstructure and Mechanical Properties of CrN Coatings deposited by HiPIMS
Hard coatings are a suitable solution for increasing the lifetime of tools and components employed in different industrial applications. Coatings of transition metal nitrides have great use for tribological applications due to due to their unique mechanical properties. Although widely employed, current deposition methods such as cathodic arc evaporation prod
Mat. Res.. Publicado em: 12/04/2018
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15. Sputtering Power Induced Physical Property Variation of Nickel Oxide Films by Radio Frequency Magnetron Sputtering
NiO thin films were deposited on Si and Corning 1737 glass substrates using radio frequency (rf) magnetron sputtering system. The physical properties of NiO films under different sputtering power were thoroughly studied. The XRD results indicated that as-prepared NiO films with the sputtering power above 100 W developed only (200) preferred orientation. The
Mat. Res.. Publicado em: 01/02/2018
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16. Influence of Si Coating on Interfacial Microstructure of Laser Joining of Titanium and Aluminium Alloys
A common phenomenon in the dissimilar joints is the presence of brittle compounds in the joining interface region. The brittle phases can decrease by introduction of interlayers in the joining interface, such as silicon, that inhibits the formation of Al3Ti and AlTi3 phases in joining process between titanium and aluminium alloys. In the present work, the jo
Mat. Res.. Publicado em: 09/11/2017
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17. Oxygen Effect on Structural and Optical Properties of ZnO Thin Films Deposited by RF Magnetron Sputtering
ZnO thin films with wurtzite structure have been grown on Si (100) and glass substrates using radio frequency (rf) magnetron sputtering at room temperature. The ZnO thin films have been characterised by XRD. The (002) orientation is observed at zero Oxygen flow after the (100) developed with increasing oxygen ratio. Usually, this orientation (100) is difficu
Mat. Res.. Publicado em: 13/03/2017
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18. Incorporation of N in the TiO2 Lattice Versus Oxidation of TiN: Influence of the Deposition Method on the Energy Gap of N-Doped TiO2 Deposited by Reactive Magnetron Sputtering
N-doped TiO2 can be deposited by reactive magnetron sputtering by two methods: incorporation of nitrogen particles in the TiO2 lattice or incorporation of oxygen particles in the TiN lattice (oxidation). This paper investigates both procedures by experimental and numerical methods in order to establish the best way for incorporation of substitutional nitroge
Mat. Res.. Publicado em: 02/03/2017
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19. Surface Properties Contrast between Al Films and TiO2 Films Coated on Magnesium Alloys by Magnetron Sputtering
Al films and TiO2 films were separately coated on AZ31 magnesium alloy substrates by means of magnetron sputtering method. The surface properties of the samples were explored and compared. Scanning electron microscope (SEM) observed the compact structure characteristics of as-deposited Al films and TiO2 films. After heat treatment under 200ºC for half an ho
Mat. Res.. Publicado em: 20/02/2017
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20. Microstructure and Properties of Coating of FeAlCuCrCoMn High Entropy Alloy Deposited by Direct Current Magnetron Sputtering
The coatings of FeAlCuCrCoMn high entropy alloy were deposited by direct current magnetron sputtering. The microstructure and the mechanical and corrosion properties of the coatings are investigated. A perfect dense and smooth coating could be obtained. The coatings exhibit single FCC solid solution as increasing deposited time. The thickness of the coatings
Mat. Res.. Publicado em: 03/06/2016
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21. Structure and Properties of Titanium Doped Tungsten Disulfide Thin Films Produced via the Magnetron Co-Sputtering DC Technique
ABSTRACT In this work, titanium doped tungsten disulfide thin films (WS2-Ti) were deposited on AISI 304 stainless-steel substrates using the magnetron co-sputtering DC technique. Films were produced with varying titanium-cathode power from 0 to 25 W. The titanium content of the WS2 structure was determined using energy dispersive spectroscopy (EDS), thereby
Matéria (Rio J.). Publicado em: 2016-06
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22. Characterization of Thin Carbon Films Produced by the Magnetron Sputtering Technique
Thin carbon films containing both amorphous and crystalline structures were produced by RF magnetron sputtering. The depositions of the carbon films were performed on Co buffer layers previously deposited on c-plane (0001) sapphire substrates. The thin carbon films were characterized by high-resolution transmission electron microscopy (HRTEM), X-ray diffract
Mat. Res.. Publicado em: 26/04/2016
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23. Desempenho físico-químico de filmes hidrofóbicos de AlN e de Ti nanoestruturado crescidos por plasma frio sobre superfícies de isoladores cerâmicos de porcelana tipo pino
Resumo A resistência mecânica e a propriedade dielétrica de isoladores cerâmicos são características fundamentais para o suporte das redes de distribuição de energia elétrica. Porém, tanto a umidade quanto o teor de poluentes na atmosfera podem vir a ser prejudiciais e causar falhas na entrega de energia por elevação da sua corrente elétrica de
Cerâmica. Publicado em: 2016-03
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24. Effects of Bias Voltage on Fen Films Prepared by Magnetron Sputtering
Iron nitride films were deposited by radio frequency (RF) reactive magnetron sputtering at different bias voltages. It was found that the composition, structure and magnetic properties of the iron nitride films were strongly dependent on the depositing bias voltage. With a bias voltage of –50 V, the iron nitride film is fully dense and has a homogenous mic
Mat. Res.. Publicado em: 17/11/2015