Characterization of Thin Carbon Films Produced by the Magnetron Sputtering Technique
Silva, Danilo Lopes Costa e, Kassab, Luciana Reyes Pires, Martinelli, Jose Roberto, Santos, Antonio Domingues dos, Ribeiro, Sidney José Lima, Santos, Moliria Vieira dos
DATA DE PUBLICAÇÃO
Thin carbon films containing both amorphous and crystalline structures were produced by RF magnetron sputtering. The depositions of the carbon films were performed on Co buffer layers previously deposited on c-plane (0001) sapphire substrates. The thin carbon films were characterized by high-resolution transmission electron microscopy (HRTEM), X-ray diffraction (XRD), Raman spectroscopy, energy dispersive X-ray spectroscopy (EDS), and field emission scanning electron microscope (FEG-SEM). The Raman spectra confirmed the presence of amorphous and crystalline structures by the existence of an intense D band separated from the G band, indicating early stages of crystallization. The interplanar distance corresponding to the graphite structures was determined by using HRTEM micrographs.
- Structure and Properties of Titanium Doped Tungsten Disulfide Thin Films Produced via the Magnetron Co-Sputtering DC Technique
- Hydrogen influence on gallium arsenide thin films prepared by rf-magnetron sputtering technique
- Caracterização nanoestrutural de filmes finos do grupo IV-B depositados por sputtering magnetron
- Electrical and morphological properties of low resistivity Mo thin films prepared by magnetron sputtering
- Filmes de óxido de índio dopado com estanho depositados por magnetron sputtering.