Characterization of Thin Carbon Films Produced by the Magnetron Sputtering Technique

AUTOR(ES)

Silva, Danilo Lopes Costa e, Kassab, Luciana Reyes Pires, Martinelli, Jose Roberto, Santos, Antonio Domingues dos, Ribeiro, Sidney José Lima, Santos, Moliria Vieira dos

FONTE

Mat. Res.

DATA DE PUBLICAÇÃO

26/04/2016

RESUMO

Thin carbon films containing both amorphous and crystalline structures were produced by RF magnetron sputtering. The depositions of the carbon films were performed on Co buffer layers previously deposited on c-plane (0001) sapphire substrates. The thin carbon films were characterized by high-resolution transmission electron microscopy (HRTEM), X-ray diffraction (XRD), Raman spectroscopy, energy dispersive X-ray spectroscopy (EDS), and field emission scanning electron microscope (FEG-SEM). The Raman spectra confirmed the presence of amorphous and crystalline structures by the existence of an intense D band separated from the G band, indicating early stages of crystallization. The interplanar distance corresponding to the graphite structures was determined by using HRTEM micrographs.

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