Magnetron Sputtering
Mostrando 25-36 de 152 artigos, teses e dissertações.
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25. Structural and Mechanical Properties of Zr-Si-N Thin Films Prepared by Reactive Magnetron Sputtering
Zirconium silicon nitride (ZrSiN) thin films were deposited by reactive magnetron sputtering in order to verify the silicon influence on coating morphology and mechanical properties. The Si/(Zr+Si) ratio was adjusted between 0 to 15% just modifying the power applied on the silicon target. Only peaks associated to ZrN crystalline structure were observed in XR
Mat. Res.. Publicado em: 23/10/2015
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26. Use of Cr Interlayer to Promote the Adhesion of SiC Films Deposited on Ti-6Al-4V by HiPIMS
AbstractIn this paper, chrome (Cr) thin films were deposited and used as interlayer between SiC films and Ti-6Al-4V substrates. Films and interlayers were obtained by using HiPIMS (High Power Impulse Magnetron Sputtering) technique. Interlayers were growth for 5, 30, and 60 minutes. The films were analyzed with respect to morphology, stoichiometry, thickness
Mat. Res.. Publicado em: 2015-10
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27. Nanostructured Titanium Film Deposited by Pulsed Plasma Magnetron Sputtering (Pdms) on a High Voltage Ceramic Insulator for Outdoor Use
In this study, the cold plasma technique was used to produce nanometric titanium films with hydrophobic and anti-fouling properties. The films where deposited on porcelain electrical insulators surfaces to minimize the effects of leakage current. The magnetron sputtering technique was used with a target of pure titanium sheet, and argon as the ionization gas
Mat. Res.. Publicado em: 2015-08
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28. Bias voltage influence on the mechanical and tribological properties of titaniumaluminum nitride coatings produced by triode magnetron sputtering
TixAl1-xN coatings were grown using the triode magnetron sputtering technique with various bias voltages between -40 V and -150 V. As the bias voltage increased, an increase in the Al atomic percentage was observed, presenting a competition with Ti and producing structural changes. Moreover, the grain size and roughness were also strongly influenced by the b
Matéria (Rio J.). Publicado em: 2015-03
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29. Pulsed bias effect on crystallinity and nano-roughness of Ti6Al4V-N films deposited by grid assisted magnetron sputtering system
This paper reports the effect of pulsed bias in comparison with DC bias on reactive deposition of Ti6Al4V-N films, obtained by Grid Assisted Magnetron Sputtering. The results obtained by X-Ray diffraction (XRD), Energy Dispersive X-ray Fluorescence Spectrometer (EDX) and Atomic Force Microscopy (AFM) show that bias condition affects the crystalline texture a
Mat. Res.. Publicado em: 2014-12
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30. Morphological and electrical evolution of ZnO: Al thin filmsdeposited by RF magnetron sputtering onto glass substrates
In this work, the surface and electrical characteristics ZnO:Al thin films deposited by RF magnetron sputtering onto glass substrates have been investigated. Analysis of surface morphologies revealed two growth stages. In the first stage, up to thicknesses of 100 nm, the films show surface structures with a granular form without preferential orientation. Bey
Mat. Res.. Publicado em: 2014-12
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31. Evaluation of piezoresistivity properties of sputtered ZnO thin films
Zinc oxide (ZnO) thin films were deposited by RF reactive magnetron sputtering on silicon (100) substrates under different experimental conditions. ZnO films were studied before and after annealing treatment at 600 °C. The crystallinity, electrical resistivity, stoichiometry, thickness, and elastic modulus of the films were investigated. ZnO piezoresistors
Mat. Res.. Publicado em: 03/06/2014
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32. Characterization of SiC thin films deposited by HiPIMS
In this work thin films of silicon carbide (SiC) were deposited on silicon wafers by High Power Impulse Magnetron Sputtering (HiPIMS) technique varying the average power of the discharge on a stoichiometric SiC target. X-ray diffraction, Raman spectroscopy, scanning electron microscopy and profilometry were used to analyze the films. It was observed that hig
Mat. Res.. Publicado em: 01/04/2014
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33. Superfícies fotocatalíticas de titânia em substratos cerâmicos. Parte II: substratos, processos de deposição e tratamento térmico
Este trabalho corresponde à segunda parte da revisão das superfícies fotocatalíticas de titânia em substratos cerâmicos. Nesta parte, são descritos os principais fatores que influenciam na obtenção da fase anatase como: substrato, processos de deposição e tratamento térmico. Nos substratos que apresentam superfícies ásperas há uma maior efici�
Cerâmica. Publicado em: 2014-03
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34. Study and characterization of indium oxynitride photoconductors
Multifunctional materials are a new class of thin films and coatings. These materials show interesting characteristics for application in many scientific areas, in special electronic and photonic technologies. These characteristics include sensitivity for thermal, light, mechanical, chemical and other influences, high resistivity, high electrical isolation a
Mat. Res.. Publicado em: 03/12/2013
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35. Study of indium nitride and indium oxynitride band gaps
This work shows the study of the optical band gap of indium oxynitride (InNO) and indium nitride (InN) deposited by magnetron reactive sputtering. InNO shows multi-functionality in electrical and photonic applications, transparency in visible range, wide band gap, high resistivity and low leakage current. The deposition processes were performed in a magnetro
Mat. Res.. Publicado em: 07/05/2013
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36. EFFECT OF INTERFACE ROUGHNESS AND HEAT-TREATMENT OF THE SUPERCONDUCTING PROPERTIES OF NB/CO MULTILAYERS / RUGOSIDADE DA INTERFACE E EFEITO DE TRATAMENTO TÉRMICO NAS PROPRIEDADES SUPERCONDUTORAS DE MULTICAMADAS NB/CO
Neste trabalho foram preparadas multi-camadas supercondutor(SC)/ ferromagneto(FM) Nb/Co via pulverização catódica (Magnetron Sputtering). O principal objetivo é estudar o efeito de diferentes espessuras da camada ferromagnética (Co) nas propriedades supercondutoras do Nb. Era esperado que, após tratamentos térmicos, as camadas de Co formassem um plano
IBICT - Instituto Brasileiro de Informação em Ciência e Tecnologia. Publicado em: 30/04/2012