Electrochemical Etching
Mostrando 1-10 de 10 artigos, teses e dissertações.
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1. Effect of Etching Temperature on Surface Properties of Ti6Al4V Alloy for Use in Biomedical Applications
The objective of this study is to evaluate the surface physicochemical properties of Ti6Al4V alloy after etching with a piranha’s solution at temperatures of 25 °C, 40 °C, and 60 °C for 30 min. Scanning electron microscopy with energy-dispersive X-ray spectroscopy, optical profilometry, X-ray diffraction, and wettability analyses were used to characteri
Mat. Res.. Publicado em: 10/01/2020
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2. Superhydrophobic silicon fabricated by phosphomolybdic acid-assisted electrochemical etching
Controllable geometry silicon surfaces with superhydrophobicity are difficult to be fabricated without photolithography techniques. Superhydrophobic silicon surfaces with water contact angle larger than 150º and sliding angle less than 10º have been successfully fabricated by electrochemical etching strategy. Squarelike hole arrays with controllable geomet
Quím. Nova. Publicado em: 26/08/2019
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3. Boron Doped Ultrananocrystalline Diamond Films on Porous Silicon: Morphological, Structural and Electrochemical Characterizations
Boron doped ultrananocrystalline diamond (BDUND) films were grown and characterized on porous silicon (PS) substrates. PS samples were prepared from n-type monocrystalline silicon wafers (100) with 1-20 Ω.cm of resistivity, by electrochemical etching, using HF-acetonitrile solution as electrolyte. BDUND films were grown by Hot Filament Chemical Vapor Deposi
Mat. Res.. Publicado em: 24/11/2015
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4. Titanium bioactivity surfaces obtained by chemical/electrochemical treatments
There are various surface treatments used to modify titanium surfaces to render it bioactive. In this study commercially pure titanium surfaces (cp Ti), grade 2 were modified by acid etching (AE) and anodic oxidation (OA) in order to evaluate the bioactivity in vitro of these surfaces using the simulated body fluid (SBF). The AE was realized using a mixture
Matéria (Rio J.). Publicado em: 2014-03
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5. Modification of the titanium oxide morphology and composition by a combined chemical-electrochemical treatment on cp Ti
A combined chemical-electrochemical oxidation method to obtain porous bioactive TiO2 films on titanium is reported. In this case, a titanium chemical pre-etching followed by the micro-arc oxidation (MAO) treatment is proposed and optimized, to obtain a high-roughness and porous surface which benefits the titanium/bone integration. The MAO treatment at variou
Materials Research. Publicado em: 20/01/2012
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6. Titanium dental implant surfaces
Osseointegration has been defined as "a direct structural and functional connection between ordered, living bone and the surface of a load-carrying implant". However, titanium and its alloys cannot directly bond to living bone after being implanted into the body. The osseointegration of titanium dental implants is critically dependent on the implant surface
Matéria (Rio de Janeiro). Publicado em: 2010
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7. DLC with silver nanoparticles study for space and biomedical applications / Estudo de crescimentos de filmes de DLC com nanopartículas de prata para aplicações espaciais e biomédicas
Diamond-like carbon (DLC) is a metastable form of amorphous carbon with high mechanical hardness, chemical inertness, optical transparency, low friction coefficient and its wear resistant. Since centuries, silver is known as bactericidal agent and, as a soft metal, its also used as a solid lubricant. This project develops a deposition process to insert silve
Publicado em: 2008
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8. SÃntese e caracterizaÃÃo de filmes finos de ITO e de silÃcio poroso
Desenvolveu-se um processo de produÃÃo de filmes finos de Ãxido de Ãndio dopado com estanho (ITO) com espessuras tÃpicas de 120 nm, depositados em substratos de vidro pela tÃcnica de evaporaÃÃo tÃrmica reativa (ETR). Os efeitos da pressÃo parcial de oxigÃnio durante a deposiÃÃo e do tratamento tÃrmico em oxigÃnio nas propriedades elÃtricas, e
Publicado em: 2008
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9. Study of electrodeposition lead telluride films on poroussilicon / Estudo de filmes de telureto de chumbo eletrodepositados sobre silício poroso
This work investigates by the first time PbTe films growth on porous silicon substrate by electrodeposition technique. It was studied porous silicon layer obtained from stain etching by using a HF:HNO3 mixtures at different etching times between 1 and 10 min. Surface morphology analyzed by scanning electron microscopy (SEM) has evidenced Si nanocrystallites
Publicado em: 2005
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10. Morphology and stress study of nanostructured porous silicon as a substrate for PbTe thin films growth by electrochemical process
Porous silicon layers (PSL) were produced by stain etching from a HF:HNO3 500:1 mixture with etching time varying in the range of 1 up to 10 min. The samples have presented nanometric porosity as a function of etching time, characteristic of heavily doped p type silicon. The residual stress and the correlation length of the layers were obtained through the a
Materials Research. Publicado em: 2004-12