Formação e reatividade de filmes finos de macrocíclicos de ferro sobre silício monocristalino / Formation and reactivity of iron macrocycle thin films on oxidized silicon wafer- SiO2/Si

AUTOR(ES)

Juliana Salvador Andresa

DATA DE PUBLICAÇÃO

2007

RESUMO

This work describes the study of model surfaces on oxidized silicon wafer, SiO2/Si, modified with N-heterocycles rings, that allows the grafting of a macrocycle iron complex, FeTIM, that could be used in reactivity studies, with biologically relevant molecules, as nitrogen monoxide (NO). On this way, the synthesis of these silanes and a new methodology of the formation of self-assembled monolayers had become a relevant question on this work applicability. These thin films contain silanes bearing nitrogenated Lewis bases on silicon surfaces. In order to obtain these modified surfaces, it was necessary a comprehensive study of the adsorption parameters of the thin films. The parameters studied were the effect of: adsorption time, the solution concentration, the role of the solvents polarity and the chain length alkylsilanes in the film formation. Then, it was possible to infer about the films morphology differences and chemical structures by the XPS, AFM and MEV measurements. X-ray photoemission lines of Fe 2p were used to probe the iron chemical environment in the chemically adsorbed macrocycles complexes.

ASSUNTO(S)

thin films silanes silanos silicio monocristalino self-assembled monolayers xps fetim silicon wafer afm fetim filmes finos automontados afm xps

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