Reactive Ion Etching
Mostrando 13-19 de 19 artigos, teses e dissertações.
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13. Fabrication and electrical characterization of field emission tips covered by DLC (Diamond Like Carbon) thin films / Fabricação e caracterização eletrica de ponteiras de emissão de campo recobertas com filme fino DLC (Diamond Like Carbon)
The objectives of this dissertation were the fabrication of silicon field emitter tips coated with diamond like carbon (DLC) thin films, and the study of its electrical behavior. We present the fabrication process of silicon tips that consists on four stages: photolithography, reactive ion etching SF6 plasma, thermal oxidation for sharpening, and the DLC dep
Publicado em: 2005
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14. Plasma etching of polysilicon and silicon nitride films for MEMS and CMOS technology / Corrosão por plasma de filmes de silicio policristalino e nitreto de silicio para tecnologia MEMS e CMOS
Este trabalho apresenta os resultados e as discussões dos mecanismos de corrosão por plasma de filmes de silício policristalino e nitreto de silício para aplicações em dispositivos MEMS e CMOS. A corrosão foi feita em um reator convencional de corrosão por plasma em modo RIE (Reactive Ion Etching). Para aplicação em MEMS, corrosões de silício pol
Publicado em: 2005
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15. Modification of plasma polymer films by ion implantation
In this work, thin polymer films were prepared from acetylene and argon radiofrequency (13.56 MHz, 80 W) glow discharges. Post-deposition treatment was performed by plasma immersion ion implantation in nitrogen or helium glow discharges (13.56 MHz, 70 W). In these cases, samples were biased with 25 kV negative pulses. Exposure time to the bombardment plasma,
Materials Research. Publicado em: 2004-09
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16. Estudo e implementação de um processo de fabricação de microponteiras de Si utilizando plasma de hexafluoreto de enxofre e oxigenio
We have developed and characterized a silicon microtip fabrication process using radiofrequency (RF) plasma. Reactive Ion Etching processes of silicon and silicon dioxide in a parallel plate reactor were established using SF6 and SF6/O2 gas mixture. The parameters of the fabrication process, such as the etch rate, selectivity, anisotropy and surface quality
Publicado em: 2004
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17. Gravação e caracterização de nanoestruturas bidimensionais em relevo
This thesis describes the recording of two dimensional surface-relief nano structures, using double holographic exposures and lithography. The experimental conditions for recording photoresist masks are described, as well as for the lithography of the two dimensional pattern in three different materials: aluminum, nickel and hydrogenated amorphous carbon. Fo
Publicado em: 2003
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18. Modificação da superficie de borracha EPDM tratada por meio de processos a plasma frio
The surface of vulcanized ethylene-propylene diene monomer (EPDM) rubber is highiy hydrophobic and so it is not suited for a number of potential applications, in particular, for to the polyurethane liner of solid propellants used in missiles and rocket. In this case, plasma treatment is a very attractive process to improve their adhesive properties. The EPDM
Publicado em: 2002
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19. Construção e caracterização de um equipamento de corrosão ionica reativa e sua aplicação na corrosão de tungstenio e fotorresiste
This work has as objective the development of a Reactive Ion Etching (RIE) System, motivated by the need of this technique for the fabrication of devices and Integrated circuits with advanced technologies. The RIE equipment has been designed, constructed and characterized. An RF generator of up to 300W at a fixed frequency has been designed and built. This r
Publicado em: 1993