Magnetron Sputtering
Mostrando 1-12 de 152 artigos, teses e dissertações.
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1. Escores Prognósticos de Mortalidade na Cirurgia Cardíaca para Endocardite Infecciosa
Resumo Filmes de TiO2 dopados com Nb podem associar propriedades como TCO (transparent conductive oxide) e super-hidrofilicidade, quando ativados por luz UV. Filmes metálicos de Ti-Nb foram depositados sobre substrato de vidro via triodo magnétron sputtering e posteriormente os filmes foram oxidados em atmosfera ambiente a 600 °C durante 1,0 h em condiç�
Arq. Bras. Cardiol.. Publicado em: 2020-03
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2. Efeito do teor de nióbio na molhabilidade de filmes TiO2:Nb
Resumo Filmes de TiO2 dopados com Nb podem associar propriedades como TCO (transparent conductive oxide) e super-hidrofilicidade, quando ativados por luz UV. Filmes metálicos de Ti-Nb foram depositados sobre substrato de vidro via triodo magnétron sputtering e posteriormente os filmes foram oxidados em atmosfera ambiente a 600 °C durante 1,0 h em condiç�
Cerâmica. Publicado em: 2020-03
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3. Interrelation Among Morphology, Mechanical Properties and Oxidation Behavior of NbxAlyNz Thin Films
NbxAlyNz thin films were deposited by magnetron sputtering reactive technique with (y/x+y) ratio varying from 0 to 0.4, in order to maintain aluminum atoms inside NbN matrix in solid solution. GAXRD analyses revealed that the crystalline phase obtained for NbxAlyNz thin films was B1-NbN with a lattice constant shrinkage as Al concentration at these coatings
Mat. Res.. Publicado em: 07/11/2019
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4. Análise comparativa das propriedades elétricas de camadas e multicamadas de VOx depositadas por pulverização catódica para aplicação em bolômetros
RESUMO Filmes finos de VOX (camada e multicamadas) foram fabricados por pulverização catódica com rádiofrequência assistida por campo magnético constante para aplicação em detectores de radiação infravermelha do tipo bolômetro. As amostras foram fabricadas sem quebra de vácuo a partir de três alvos: V2O3; VO2 e V2O5. Um sistema de pulverização
Matéria (Rio J.). Publicado em: 20/05/2019
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5. Oxidation Behavior of Al-Y Coating on γ-TiAl at 900°C
ABSTRACT In this study, an Al-Y coating was applied to enhance the property of oxidation resistance on the surface of γ-TiAl alloys by rf magnetron sputtering. The isothermal oxidation tests were investigated at 900 °C for 100 h. The coating characteristics and microstructure of coating after isothermal oxidation were inspected by XRD and SEM methods respe
Matéria (Rio J.). Publicado em: 20/05/2019
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6. Influência da densidade de potência e da porcentagem de N2 na atmosfera de deposição na dureza e no módulo de Young em filmes de aço inoxidável AISI 316 depositados por pulverização catódica
RESUMO O processo de recobrimento por pulverização catódica é uma técnica amplamente utilizada para produção de revestimentos metálicos e cerâmicos, devido a versatilidade no controle das propriedades com pequenas mudanças nos parâmetros de processo, como densidade de potência aplica ao cátodo magnetron e atmosfera de trabalho. Sendo assim, as p
Matéria (Rio J.). Publicado em: 20/05/2019
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7. Al-doping and Properties of AZO Thin Films Grown at Room Temperature: Sputtering Pressure Effect
Aluminum zinc oxide (AZO) thin films were synthesized on glass substrates by radio frequency (rf) magnetron sputtering from a metallic Zn-Al (5 at. %) target at room temperature. The morphological, structural, electrical and optical properties of the films were studied as a function of the sputtering pressure, which was varied from 0.1 to 6.7 Pa. X-ray diffr
Mat. Res.. Publicado em: 09/05/2019
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8. Nb-doped Ti2O3 Films Deposited Through Grid-Assisted Magnetron Sputtering on Glass Substrate: Electrical and Optical Analysis
Abstract Niobium doped dititanium trioxide (Ti2O3:Nb) films were deposited on glass substrates, through grid-assisted magnetron sputtering. The Ti2O3:Nb films were characterized by X-ray diffraction (XRD), electrical conductivity and optical properties. Film deposition was carried out in two different substrate bias modes: DC and unipolar pulsed. Results sho
Mat. Res.. Publicado em: 24/01/2019
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9. Tribological behavior of hydrogenated W-C/a-C:H coatings deposited by three different sputtering techniques
Abstract The evolution of structure, mechanical properties and friction behavior of DC magnetron sputtered (DCMS), high power impulse magnetron sputtered (HiPIMS) and high target utilization sputtered (HiTUS) W-C:H coatings was investigated as a function of the addition of acetylene and hydrogen into Ar atmosphere. The gradual addition of reactive gases caus
Cerâmica. Publicado em: 2019-01
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10. Physical Properties of Sputtered Indium-doped ZnO Films Deposited on Flexible Transparent Substrates
Indium-doped zinc oxide (IZO) polycrystalline thin films were grown on polyethylene terephthalate (PET), polyethylene naphthalate (PEN), and as reference on 7059 Corning glass substrates at room temperature by radio frequency magnetron sputtering from a target prepared with a mixture of ZnO and In2O3 powders. The structural, optical, and electrical propertie
Mat. Res.. Publicado em: 06/09/2018
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11. Synthesis and characterization of nanostructured TiO2 and TiO2/W thin films deposited by co-sputtering
ABSTRACT Nanostructured TiO2 and TiO2/W thin films were deposited on Corning glass substrates by RF and DC magnetron co-sputtering at room temperature, using three targets of TiO, Ti and W. After deposition, samples were subjected to an annealing treatment in air at 500 °C for 3 hrs. The effect of the annealing treatment and tungsten addition to the TiO2 ma
Matéria (Rio J.). Publicado em: 19/07/2018
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12. Evaluation of Carbon thin Films Using Raman Spectroscopy
Carbon thin films deposited by the magnetron sputtering technique were evaluated by Raman spectroscopy to study the influence on their crystallinity caused by different parameters like the carbon deposition time, the different buffer-layers and substrates employed and also two distinct heat treatments. The present results showed that the choice of these para
Mat. Res.. Publicado em: 07/06/2018