Study of incorporations of donor impurities in III-V semiconductor structures grown by molecular beam epitaxy. / Estudo de incorporações de impurezas doadoras em estruturas semicondutoras III-V crescidas por epitaxia por feixes moleculares.

AUTOR(ES)

Airton Carlos Notari

DATA DE PUBLICAÇÃO

1993

RESUMO

III-V semiconductor samples were grown using the Molecular beam epitaxy technique, the electrical properties of the GaAs structures planar doped with silicon were investigated as well as the Silicon saturation and diffusion in these samles. The optcal and electrical properties of structures planar doped with Selenium were analyzed using the Capacitance Voltage and resonant Tunneling techniques. The electrical properties of InGaAs/ GaAs based quantum wells were investigated as a function of the planar doped with Silicon impurity position.

ASSUNTO(S)

efm mbe semicondutores iii-v semiconductors iii-v dopagem crescimento de semicondutores doping growth of semiconductor

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