Influence of ativation of self-etching adhesives systems on the microtensile bond strength and quality of hibrydization in dentin and enamel / Influencia da distancia da ativação dos sistemas adesivos autocondicionantes na resistencia de união e qualidade da hibridização em dentina e esmalte

AUTOR(ES)
DATA DE PUBLICAÇÃO

2009

RESUMO

The self-etching adhesives systems present high water content that are used as solvent for acid monomer ionization. The presence of the excess of this solvent in the hybrid layer can compromise its the formation, as well as to affect the polymerization of monomers producing bonding interfaces permeables. The use of self-etching adhesives in clinical situations of Class II cavities with deep box, presents beyond the problems related to its composition, the possibility to have the quality of polymerization affected for the distance of the source of light in the deepest walls. Thus the purpose of this study was to evaluate the influence of the light-tip distance of a halogen light-curing lights in the microtensile bond strength (MTBS) and to evaluate the quality of hybridization through the nanoleakage of self-etch adhesive systems applied to substrate of enamel and dentine. For the accomplishment of this study 198 bovine incisors and three selfetching adhesive systems were used, Clearfil Protect Bond, Clearfil Tri-S and One up Bond F Plus that were applied in plain surfaces of enamel and dentine. The photoactivation of the adhesives was carried through at 0,5, 3 and 6 mm distances and after a 4-mm thick TPH3 composite block was built. The results showed that distance of the light-guide did not influence significantly the MTS, however the same one were dependent of the adhesive system and substrate, where the adhesive of two steps Clearfil Protect Bond (Kuraray) presented better behavior in all experimental conditions. Between dentals substrate the enamel showed highest mean bond strength. For the nanoleakage analysis, the threeway ANOVA detected no significant difference for the distance of the lightcuring tip and significant differences for the adhesive (p<0.0001) and substrate (p<0.0001) factors, and the double interactions between distance X substrate (p=0.0159) and between adhesive X substrate (p = 0.0079) were also significant. For the interaction distance X substrate, no significant difference in nanoleakage was observed among groups light-activated with curing unit tip having a distance of 3 and 6 mm when the adhesive interfaces were in dentin. On the other hand, such groups showed lower nanoleakage than those with 0,5 mm distance between curing unit tip and the bonded surface. Thus for the data observed in this study it could be concluded that the distance of the light-guide did not influence the !TBS values of the adhesives systems and the nanoleakage patterns of the enamel interfaces. However, the nanoleakage patterns were adversely influenced by photoactivation at distances of 0,5 and 6 mm

ASSUNTO(S)

silver nitrate dental adhesives nitrato de prata adesivos dentarios material resistance resistencia de materiais

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