Microscopy And Rutherford Spectrometry
Mostrando 1-5 de 5 artigos, teses e dissertações.
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1. Construção de nanoestruturas e caracterização por SEM e RBS / Construction of nanostructures and characterization by SEM and RBS
Nanostructured materials have properties that make these materials different from their counterpart in higher scale that opens many novel possibilities and technical applications. One of the main issues in nanotechnology is to develop suitable methods for the analysis and characterization of nanostructures. This works studies the use of Rutherford Backscatte
Publicado em: 2008
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2. Fabricação e caracterização de termopares Cu/CuNixPy obtidos por deposição eletroquímica. / Fabrication and characterization of Cu/CuNixPy thermocouples obtained by electroless deposition.
In this work, it was studied chemical depositions of CuNixPy alloys and it was fabricated Cu/CuNixPy thermocouples onto silicon wafer surfaces. Initially, surfaces were pre-activated in a diluted hydrofluoric acid solution containing PdCl2. Following, it was used a de-ionizedwater- diluted alkaline chemical bath containing 15 g/l NiSO4.6H2O; 0,1-0,3 g/l CuSO
Publicado em: 2008
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3. PROPRIEDADES ESTRUTURAIS, MECÂNICAS E TRIBOLÓGICAS DE FILMES DE TIB2 E TI-B-N DEPOSITADOS POR EROSÃO CATÓDICA / STRUCTURAL, MECHANICAL AND TRIBOLOGICAL PROPERTIES OF TIB2 AND TI-B-N FILMS DEPOSITED BY REACTIVE DC MAGNETRON SPUTTERING
The main purpose of the present work was the study of the effects on the structural, mechanical and tribological properties of the incorporation of nitrogen in titanium diboride films (TiB2) grown by reactive dc magnetron sputtering. Ti-BN coatings with different N contents were deposited on Si (100) substrates from a TiB2 target. The sputtering was carried
Publicado em: 2007
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4. Estudo de filmes finos de TiOx crescidos por sputtering para aplicações fotoeletroquimicas
The morphological, structural and electrical properties of rf-sputter deposited TiOx films were studied as a function o the substrate temperature (TS) and the oxygen flow rate (FO2). The possibility of applying the TiOx films as electrodes for phenol detection in water through photocurrent measurements in a photoelectrochemical cell was also explored.The x v
Publicado em: 2004
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5. Análise das propriedades químicas, morfológicas e estruturais de filmes finos de a-Si1-xCx:H depositados por PECVD. / Analysis of the chemical, morphological and structural properties of a-Si1-xCx:H thin films deposited by PECVD.
In this work we discuss the growth and characterization of amorphous hydrogenated silicon carbide thin films (a-Si1-xCx:H) deposited by plasma enhanced chemical vapor deposition (PECVD). It was used a gaseous mixture of silane, methane and hydrogen, at the silane starving plasma regime. Samples grown at these conditions and with a very low silane flow have a
Publicado em: 2001