Estudo de filmes finos de TiOx crescidos por sputtering para aplicações fotoeletroquimicas
AUTOR(ES)
Ana Carola Iniguez Calero
DATA DE PUBLICAÇÃO
2004
RESUMO
The morphological, structural and electrical properties of rf-sputter deposited TiOx films were studied as a function o the substrate temperature (TS) and the oxygen flow rate (FO2). The possibility of applying the TiOx films as electrodes for phenol detection in water through photocurrent measurements in a photoelectrochemical cell was also explored.The x values were obtained by Rutherford backscattering spectrometry (RBS), the anatase-to-rutile ratio (A/R) and crystallite size (D) by X-ray diffraction (XRD) and the morphology and roughness by atomic force microscopy (AFM). The oxidation states in the samples were determined by X-ray photoelectron spectroscopy (XPS). The photon-to-electron conversion efficiency ( f ) was deduced from photocurrent measurements in the photoelectrochemical cell. Most of the films were found to be substoichiometric (1.80 dioxido de titanio titanium dioxide
ASSUNTO(S)
ACESSO AO ARTIGO
http://libdigi.unicamp.br/document/?code=vtls000344678
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