Sistema para corrosão anisotropica profunda de sensores microeletromecanicos / Anisotropic etching system for micro electrical mechanical sensor

AUTOR(ES)
DATA DE PUBLICAÇÃO

2009

RESUMO

Integrated Silicon Sensors and Microelectromechanical Systems (MEMSs) have been developing drived mainly by the micro and nanoelectronic industry s continuous growth. As a result, MEMSs have been spreading out very quickly into commercial products. In fact, MEMSs have undertaken room in automotive market where pressure sensors as well as accelerometers have more and more become essential devices. In this work we developed and characterized a Silicon Anisotropic Wet Etching Reactor, which is capable to realize deep etchings (>200um). This reactor makes possible the microfabrication of membranes (for pressure sensors mainly) and cantilevers (for accelerometers mainly) in integrated circuits and in wafers with a predefined active electronic. We investigated factors such as quality and repeatability of the etching as well as its compatibility with the microelectronic process. To support our study, microstructres were fabricated and compared with the results acquired from a 2D Anisotropic Etching Simulation software. We concluded that due to the good repeatability of the etching rate a precise control of the microstructures can be realized by just using the time-stop method. To close our study, the reactor was used to microfabricate a membrane in the back-side of a wafer with active electronic in the front-side using KOH as etchant in order to realize a pressure sensor. As a result, a microelectronic pressure sensor was entirely designed, fabricated and characterized using national technology

ASSUNTO(S)

microeletronica corrosion integrated circuits microelectronics sensors detectores circuitos integrados corrosão

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