Silicon Nanostructuring Using SF6/O2 Downstram Plasma Etching: Morphological, Optical and Sensing Properties

AUTOR(ES)

Saloum, Saker, Zrir, Mohammad Ali, Alkhaled, Bachar, Shaker, Samer Abo

FONTE

Mat. Res.

DATA DE PUBLICAÇÃO

10/07/2018

RESUMO

Silicon (Si) nanostructures were prepared in the downstream of radiofrequency SF6/O2 mixture plasma generated in 13.56 MHz hollow cathode discharge system. Depending on the oxygen percentage in the mixture, the obtained Si nanostructures were characterized for their different properties: etching rate, morphology, optical reflectance, photoluminescence, spectral response and humidity sensing. It is found that the etching rate exhibits a maximum value when the O2 ratio reaches 5%. An interesting defect-induced "violet" luminescence is reported from the Si nanostructures, whose intensity depends on their density. The obtained Si nanostructures have shown to induce a spectral response (SR) enhancement, in comparison with a smooth Si substrate, of about 100 times at 1100 nm wavelength. A very short response time (1 sec) to the humidity was measured for 5% O2 in the SF6/O2 plasma mixture, which was found to be well-correlated with the porosity of the Si nanostructures.

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