Inductively coupled fluorine plasmas. / Plasmas fluorados com acoplamento indutivo.

AUTOR(ES)

Bruno da Silva Rodrigues

DATA DE PUBLICAÇÃO

2006

RESUMO

In this work, inductively coupled plasmas have been studied, using optical emission spectroscopy and electrical measurements. Four gases were analysed : argon, being an inert gas, oxygen because it is slightly electronegative, SF6 because it is very eletronegative and also etches silicon and its compounds and CF4 because it also etches silicon and its compounds and is slightly electronegative. Also the mixtures of oxygen, SF6, important to silicon etching and CF4 with argon were studied. The studies indicated that it is necessary to have a minimum concentration of free electrons in the plasma to obtain an inductively coupled plasma. This depends very strongly on the power levels applied to the cathode and the coil of the reactor, The less electronegative the gas, the lower these power levels. Hence it was easiest to obtain argon inductively coupled plasmas, followed by the argon mixtures and with the pure gases it more difficult to obtain ICP plasmas with the available hardware. Two materials were studied as cathode material: tin and aluminium. When using SF6, the highest F concentration was obtained with the tin electrode, but for CF4 gases, the highest fluorine concentration was obtained with the aluminium electrode.

ASSUNTO(S)

oes espectrometria de emissão icp plasma icp plasma

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