Hydrogen influence on gallium arsenide thin films prepared by rf-magnetron sputtering technique

We investigate the effect of the hydrogen intentional incorporation on the structural properties of the amorphous gallium arsenide prepared by rf-magnetron sputtering technique. The properties of the non-hydrogenated films are: band gap of 1.4 eV (E04), Urbach energy of 110 meV, stoichiometric composition ([As]/[Ga] = 0.50), and dark conductivity of about 3.2 x 10-5 (omega.cm)-1. Hydrogen was incorporated in the films by the introduction of an electronically controlled H2 flux during deposition, keeping constant the other deposition parameters. It was observed that small hydrogen incorporation...

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