Electroless Deposition
Mostrando 1-9 de 9 artigos, teses e dissertações.
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1. Morphology Behavior of Copper Films Deposited after Wet Surface Treatment on Polished Alumina
In this paper, a pre-treatment process for electroless copper (Cu) deposition on the polished alumina (Al2O3) 99.9% and the behavior of Cu plating by electroless process after Al2O3 surface treatment were explored. Our work was carried out by changing the roughness of Al2O3 through micro-etching (coarsening), nucleation its surface by a two-step method (sens
Journal of the Brazilian Chemical Society. Publicado em: 2022
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2. Influence of the Tungsten Content on Surface Properties of Electroless Ni-W-P Coatings
Ternary Ni-W-P films were produced by electroless deposition using baths with different tungsten concentrations. After deposition, the coated surfaces were annealed at 400°C for 1h. Surface morphology and film composition in the as-plated condition were assessed by SEM and EDS analyses, respectively. The crystalline phases after annealing were investigated
Mat. Res.. Publicado em: 21/11/2017
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3. Characterization of copper microelectrodes, following a homemade lithography, technique, and gold electroless deposition
We report the fabrication and characterization of copper microelectrodes obtained by a homemade lithography technique and after gold electroless deposition. For the fabrication, planes consisting of arrays of electrodes (black in color) with bow tie shape were designed and printed on a transparent paper (Canson ltd.). Using an embroidery frame with a silk fa
Matéria (Rio J.). Publicado em: 2016-03
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4. Electroless Plating of Ni-P-W Coatings Containing Scattered Nb2O5 on Sintered NdFeB Substrate
AbstractThe ternary Ni-P-W coatings containing scattered Nb2O5particles were deposited on the sintered NdFeB substrates by electroless plating. The effect of experimental processing parameters on the deposition rate was investigated during electroless plating. The coatings performance, such as corrosion resistance, interfacial adhesion strength and micro-har
Mat. Res.. Publicado em: 2015-10
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5. Electroless deposition of bis(4'-(4-Pyridyl)-2,2':6',2''-terpyridine)iron(II) thiocyanate complex onto carbon nanotubes modified glassy carbon electrode: application to simultaneous determination of ascorbic acid, dopamine and uric acid
Um eletrodo de carbono vítreo modificado por nanotubos de carbono de paredes múltiplas (NTCPM) e pelo complexo tiocianato de bis(piterpi) ferro(II) (piterpi = 4'-(4-piridil)-2,2':6',2"-terpiridina) foi investigado através de métodos voltamétricos em solução de tampão acetato (pH 5). A performance do eletrodo modificado pelo complexo de ferro(II)/NTCP
Journal of the Brazilian Chemical Society. Publicado em: 2011-03
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6. Corrosão anisotropica e formação de superficie nanoestruturada de Si utilizando plasma de alta densidade / Si anisotropic etching and nanostructured surface formation using high density plasma
This work explores the implementation, characterization and applications of BOSCH type process for bulk silicon etching (or bulk silicon micromachining) using inductively coupled high density plasma (ICP). This etching process is characterized by its high anisotropy and is performed by alternating etching steps, employing SF6 + Ar gas mixture, and passivatio
IBICT - Instituto Brasileiro de Informação em Ciência e Tecnologia. Publicado em: 29/07/2009
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7. Fabricação e caracterização de termopares Cu/CuNixPy obtidos por deposição eletroquímica. / Fabrication and characterization of Cu/CuNixPy thermocouples obtained by electroless deposition.
In this work, it was studied chemical depositions of CuNixPy alloys and it was fabricated Cu/CuNixPy thermocouples onto silicon wafer surfaces. Initially, surfaces were pre-activated in a diluted hydrofluoric acid solution containing PdCl2. Following, it was used a de-ionizedwater- diluted alkaline chemical bath containing 15 g/l NiSO4.6H2O; 0,1-0,3 g/l CuSO
Publicado em: 2008
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8. Preparation and characterization of mixed modified electrodes used in electrocatalytic hydrogenation of organic substrates / Preparação e caracterização de eletrodos modificados mistos e seu uso em hidrogenação eletrocatalítica de substratos orgânicos
This thesis describes the preparation of new modified electrodes (MEs) using the method of noble metal particles deposition like nickel, palladium and platinum in the surface of commum metals particles as cooper and iron. This new electrodes were denominated mixed MEs, and can show different caractheristics and present higher efficiency than others already s
Publicado em: 2006
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9. Study of electrodeposition lead telluride films on poroussilicon / Estudo de filmes de telureto de chumbo eletrodepositados sobre silício poroso
This work investigates by the first time PbTe films growth on porous silicon substrate by electrodeposition technique. It was studied porous silicon layer obtained from stain etching by using a HF:HNO3 mixtures at different etching times between 1 and 10 min. Surface morphology analyzed by scanning electron microscopy (SEM) has evidenced Si nanocrystallites
Publicado em: 2005