Propriedades estruturais e opticas de filmes finos de oxido de titanio depositados por PECVD

AUTOR(ES)
DATA DE PUBLICAÇÃO

1999

RESUMO

In this work, the plasma deposition of thin titanium oxide films and plasma particle formation processes have been investigated. The films were produced in a newly developed deposition technique derived from the conventional PECVD (Plasma Enhanced Chemical Vapor Deposition) proceedure. In this technique, which has been named modified PECVD, the films are deposited onto an additional electrode placed out of the intense plasma region. The samples produced in plasmas of titaniumtetraisopropoxide (TiPT)-He-Ar and TiPT-He-O2 mixtures in several condictions of reactor pressure and substrate temperature and bias were characterized by infrared reflectance-absorption (IRRAS), X-ray photoelectron (XPS), Rutherford Backscattering (RBS) and transmittion ultraviolet-visible (UV-VIS) spectroscopies. Furthermore, X-ray diffaction (XRD), microindentation and the two probe method have also been applied. The plasma particle formation has been investigated by CCD imaging, laser light scattering (LLS), actinometric optical emission spectroscopy (AOES), Langmuir probe, scanning electron microscopy (SEM) and electron probe microanalysis (EPMA)

ASSUNTO(S)

filmes finos polimerização em plasma

ACESSO AO ARTIGO

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