Leis de escala e dimensão fractal em filmes finos : microscopia de força atomica e tecnicas eletroquimicas

AUTOR(ES)

Tersio Guilherme de Souza Cruz

DATA DE PUBLICAÇÃO

2002

RESUMO

In this work, the surface morphology of NiOx and MoOx thin films deposited by r.f. sputtering was studied by atomic force microscopy and electrochemical techniques (cyclic voltammetry and electrochemical impedance spectroscopy). For each technique, the surface characterization was done by the fractal dimension, using the concept of scaling laws. The results of atomic force microscopy showed a typical grain morphology, characteristic of r.f. sputtered films. For all samples, two fractal dimension values were obtained, indicating two distinct growth dynamics: a global one, corresponding to the distribution of the grains at the surface, and a local one, associated to the morphology at the top of each grain. Similar results were obtained by cyclic voltammetry and electrochemical impedance spectroscopy. In the first technique, local scaling regimes are sensed at high scan rates and global scaling regimes corresponds to measurements performed at low scan rates. The selected frequency range for the electrochemical impedance spectroscopy measurements allowed to sense the smallest structures (local regime). In all cases, the calculated fractal dimension values are in excellent agreement

ASSUNTO(S)

voltametria ciclica dimensão fractal filmes finos

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