Investigações sobre o processo de deposição de filmes em plasmas de organometalico

AUTOR(ES)
DATA DE PUBLICAÇÃO

1995

RESUMO

Thin films were deposited by plasma polymerization from plasmas of mixtures of tetramethylsilane (TMS), He and Ar with oxygen and with nitrogen. Both the discharges and the films were studied. Three deposition systems were used. In the first, a direct current plasma was maintained between circular parallel-plate electrodes mounted in a Pyrex reactor. In the second, used only for the discharges containing oxygen, permanent magnets mounted within the cathode were also used to intensify the discharge in a so-called magnetron system. In the third, a radiofrequency (RF) system, the plasmas were excited by RF fields (40 MHz) applied to two intemal circular electrodes within a stainless-steel chamber. The plasmas were studied by optical emission spectroscopy using the actinometric method, with argon employed as the actinometer. The relative concentrations of various chemical species in the plasma were studied as a function of the proportion of oxygen or nitrogen in the feed. The principal reactive species observed in the plasmas fed with oxygen were CO, CH, OH, H, O and H2, while in the plasmas fed nitrogen, CN, CH, H and N2 were observed. Using a profilometer, the deposition rates of the films produced in the three systems were determined as a function of the proportion of oxygen or nitrogen in the feed. Transmission infrared spectrophotometry was used to investigate the molecular structure of films deposited in plasmas fed different proportions of oxygen or nitrogen. This revealed that the introduction of oxygen or nitrogen into the plasma results in the incorporation of these elements into the deposited material, forming groups such as C=O, O-H and Si-O-Si, and N-H and Si-NH-Si. In addition, it was observed that the density of these groups in the films depends on the proportion of oxygen or nitrogen in the feed. From transmission ultraviolet-visible spectra the refractive index and extinction coefficient of the films were determined. Thus it was observed that, for example, for the RF system, as the proportion of oxygen in the feed was increased the extinction coefficient was reduced. In addition, the refractive index of these films fell from 1.63 to 1.54 as the proportion of oxygen in the feed was increased from 0 to 25%

ASSUNTO(S)

pecvd espectroscopia de plasma polimerização a plasma filmes finos espectroscopia de infravermelho

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