Hardness evaluation, stoichiometry and grain size of titanium nitride obtained with plasma nitriding on Ti-6AI-4V samples

AUTOR(ES)

Vasconcellos, Marcos Antonio Zen

DATA DE PUBLICAÇÃO

2011

RESUMO

Titanium nitride films were formed on the surface of Ti-6Al-4V discs by plasma nitriding (glow discharge) in different N2:H2 atmospheres at several substrate temperatures. In this study the influence of the process parameters on dynamic micro-hardness were investigated. Grain sizes of the nitride films, determined with X-Ray Diffraction, were related to the nitriding parameters. TiNx stoichiometry was determined with Nuclear Reaction Analysis and showed a correlation to substrate temperature during the nitriding process. Micro-hardness measurements were taken on the nitrided surfaces. Grain sizes increased for a particular gas composition of 60%N2+40%H2 where hardness was lowest.

ASSUNTO(S)

ciencia dos materiais glow discharge titanio nitride hardness difracao de raios x

Documentos Relacionados

• Hardness evaluation, stoichiometry and grain size of titanium nitride films obtained with plasma nitriding on Ti-6Al-4V samples
• Analysis of titanium casting s situation and of laser-weld joint s quality made in Ti cp and Ti-6AI-4V structures
• Hybrid processing of Ti-6Al-4V using plasma immersion ion implantation combined with plasma nitriding
• Vickers hardness of cast commercially pure titanium and Ti-6Al-4V alloy submitted to heat treatments
• Effects of plasma immersion ion implantation (PIII) of nitrogen on hardness, composition and corrosion resistance of Ti-6Al-4V alloy