Estudo da eletrocristalização de Ni e Ni-P sobre ultramicroeletrodo de platina
AUTOR(ES)
Eguiluz, Katlin Ivon Barrios, Avaca, Luis Alberto, Barin, Cláudia Smaniotto
FONTE
Química Nova
DATA DE PUBLICAÇÃO
2008
RESUMO
This work describes a comparative study of the electrocrystallization of Ni and Ni-P on Pt ultramicroelectrodes using chronoamperometric measurements. It was possible to confirm that in all cases a progressive nucleation was the predominant mechanism. Moreover, the application of the Atomistic Theory to the experimental rate of nuclei formation showed that the number of atoms in the critical nucleus was zero, except for Ni-P on Pt at low overpotentials were a value of one was observed. Furthermore, the physical characterisation of the different deposits on Pt by atomic force microscopy allowed observing the coalescence of the hemispherical nuclei of Ni and Ni-P at t max thus confirming the results obtained from the current-time analysis.
Documentos Relacionados
- Eletrodeposição de NiP e NiP + particulas por corrente pulsada
- Avaliação da adesão e da dureza ao risco pelo ensaio de riscamento de recobrimentos químicos de Ni-P
- Moldagem por injeção da PA 6.6 em moldes de estereolitografia metalizados com Ni-P pelo processo electroless
- The Effect of Electroless Bath Parameters and Heat Treatment on the Properties of Ni-P and Ni-P-Cu Composite Coatings
- Wear Behaviour of Electroless heat Treated Ni-P Coatings as Alternative to Electroplated hard Chromium Deposits