Electrodeposition Study of Ni Coatings on Copper from Choline Chloride-Based Deep Eutectic Solvents

AUTOR(ES)
FONTE

J. Braz. Chem. Soc.

DATA DE PUBLICAÇÃO

2017-07

RESUMO

Nickel was electrodeposited from choline chloride (ChCl)-based deep eutectic solvents (DESs) containing ethylene glycol (EG) and urea (U) on Cu substrate. The influence of the temperature and of DESs nature was evaluated. The diffusion coefficients of nickel varied from 2.2 × 10-9 to 3.7 × 10-8 cm2 s-1 for ChCl:2U and from 1.3 × 10-8 to 5.8 × 10-8 cm2 s-1 for ChCl:2EG with increasing temperature. The nucleation process of Ni on Cu at 70 °C was determined as instantaneous in ChCl:2EG and progressive in ChCl:2U using Scharifker and Hills model. The SEM characterization showed that with increasing temperature, more compact coatings were obtained. Linear polarization and electrochemical impedance spectroscopy were used to evaluate the corrosion performance of the obtained deposits in 3.5% NaCl. The coatings were more protective as higher the temperature of deposition, with polarization resistance (Rp) values from 3.53 to 19.11 kΩ cm2.

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