Deposição de filme de diamante policristalino e diamond-like carbon-DLC por chama oxi-acetilenica
AUTOR(ES)
Mario Susumo Haga
DATA DE PUBLICAÇÃO
1997
RESUMO
Recent advances in the CVD (chemical vapor deposition) process for low pressure deposition of the diamond and od the DLC (diamond-like carbon) have attracted many researches into this field in academic and industrial laboratories. The unusual physical and chemical properties of these materials make them highly desirable for scientific and technological applications. In this thesis work the oxy-acetylene flame method has been applied to grow diamond and DLC films. A typical diamond self-standing sample has been deposited on TiN substrate at 800º C, using a water coolef nozzle with pre-mixed gases. The ratio O2/C2H2 was held at 0,9 and oxygen flux of 670 sccm for about three hours. The detached thick film has been characterized by X-ray diffraction in a novel methodology as applied to diamond particles embedded in an amorphous matrix. A thin S-ray beam has been scanned point by point along a diameter of the sample. In this way the amount of crystaline phase has been mapped and quantified relatively to the amorphous phase
ASSUNTO(S)
ACESSO AO ARTIGO
http://libdigi.unicamp.br/document/?code=vtls000115021Documentos Relacionados
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